Chelsea academy duo set for Stamford Bridge stay amid exit links

Callum Hudson-Odoi and Ruben Loftus-Cheek expected to remain at Chelsea

The duo of Callum Hudson-Odoi and Ruben Loftus-Cheek are expected to remain at Chelsea this summer. The Athletic (subscription required) claim that Hudson-Odoi will not be allowed to leave on loan while Matt Law of The Telegraph provided the update about Loftus-Cheek.

Hudson-Odoi was one of those names that broke out in a spectacular manner but has since failed to live up to the expectations. A lot of factors have been responsible for the same such as managerial changes, tactical switches and lack of game time, along with off-the-field issues. The bright and talented youngster currently finds himself on the fringes of Thomas Tuchel’s new-look side.

Callum Hudson-Odoi of Chelsea linked with a move to Lazio under Maurizio Sarri.
Callum Hudson-Odoi of Chelsea linked with a move to Dortmund. (imago Images)

Ruben Loftus-Cheek, much like his academy counterpart, was pushed into the side amid much fanfare. However, he has had mixed loan spells at clubs like Crystal Palace and Fulham. His chances look hardly any better than last season as Chelsea have the likes of Jorginho, N’Golo Kante and Mateo Kovacic to call upon.

Hence, both were linked with moves away from Stamford Bridge. Hudson-Odoi was the subject of a loan interest from Borussia Dortmund. However, he will not be allowed to leave as it is understood as Tuchel wants him to remain. Loftus-Cheek was wanted by Napoli but will now likely remain at the club for this season at least.

Ruben Loftus-Cheek is currently out on loan at Fulham
Ruben Loftus-Cheek spent the last season out on loan at Fulham

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One of the reasons for keeping the duo might be the fact that Chelsea have not brought in more signings apart from Romelu Lukaku and Marcus Bettinelli. There are too many games to play over a season nowadays and having players like the aforementioned duo might help in that regard. After all, they are youngsters with a lot of talent and potential.